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Nanolithography and surface microscopy with electron beams /

This volume, part of the Advances in Imaging and Electron Physics series, explores the development and applications of scanning electron microscopy (SEM) and electron beam technologies, as recounted by Lord Broers. The book provides insights into the early days of SEM development, detailing innovati...

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Bibliographic Details
Corporate Author: ScienceDirect (Online service)
Other Authors: Hÿtch, Martin (Editor), Hawkes, Peter W. (Editor)
Format: eBook
Language:English
Published: London, England : Academic Press, [2024]
Edition:First edition.
Series:Advances in imaging and electron physics ; Volume 231.
Subjects:
Electron microscopy.
Microscopie électronique.
electron microscopy.
Electronic books.
Online Access:Connect to the full text of this electronic book
Table of Contents:
  • Front Cover
  • Nanolithography and Surface Microscopy with Electron Beams
  • Copyright
  • Contents
  • Preface
  • Author´s preface
  • Chapter One: Early life
  • Geelong Grammar School
  • Melbourne University
  • Chapter Two: SEM/ion beam system for examining ion etched surfaces
  • Summary of the final lens specifications
  • Theoretical estimation of beam diameter
  • Mass filter for the ion beam
  • Electrostatic quadrupole filter
  • Magnetic deflection filter
  • Shape of the magnetic deflecting field
  • Performance of the magnetic deflection filter
  • References
  • Chapter Three: SEM examination of ion-etched metal and semiconductor crystals
  • Introduction
  • Formation of cones underneath particles of shielding material on the surface of ion-etched samples
  • Introduction
  • Results
  • Interpretation of results
  • Ion etching of mechanically distorted aluminum crystals
  • Introduction
  • Experimental results
  • Summary and interpretation of results
  • Formation of ridges on the surface of ion-etched crystalline metal specimens
  • Introduction