Thin films by chemical vapour deposition /
The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several uniqu...
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| Format: | eBook |
| Language: | English |
| Language Notes: | English. |
| Published: |
Amsterdam ; New York : Bucharest, Romania :
Elsevier ; Editura Tehnică,
1990.
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| Series: | Thin films science and technology ;
7. |
| Subjects: | |
| Online Access: | Connect to the full text of this electronic book |
| Summary: | The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overvie. |
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| Item Description: | Rev., updated, and enl. translation of: Depunerea chimică din vaporie a straturilor subțiri. |
| Physical Description: | 1 online resource (717 pages) : illustrations |
| Format: | Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |
| Bibliography: | Includes bibliographical references (pages 525-681) and indexes. |
| ISBN: | 9781483291734 1483291731 |