Ion implantation and beam processing /

Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semicond...

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Bibliographic Details
Corporate Author:	ScienceDirect (Online service)
Other Authors:	Williams, James S. (James Stanislaus), 1948-, Poate, J. M.
Format:	eBook
Language:	English
Language Notes:	English.
Published:	Sydney ; New York : Academic Press, 1984.
Subjects:	Ion implantation. Ion bombardment. Semiconductor doping. Electron beams. Ions > Implantation. Bombardement ionique. Semi-conducteurs > Dopage. Faisceaux électroniques. TECHNOLOGY & ENGINEERING > Mechanical. Electron beams Ion bombardment Ion implantation Semiconductor doping Ionenimplantation Semiconductors > Implantation of ions Electronic books.
Online Access:	Connect to the full text of this electronic book

Published 1984

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