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Ion implantation and beam processing /

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Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semicond...

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Bibliographic Details
Corporate Author: ScienceDirect (Online service)
Other Authors: Williams, James S. (James Stanislaus), 1948-, Poate, J. M.
Format: eBook
Language:English
Language Notes:English.
Published: Sydney ; New York : Academic Press, 1984.
Subjects:
Ion implantation.
Ion bombardment.
Semiconductor doping.
Electron beams.
Ions > Implantation.
Bombardement ionique.
Semi-conducteurs > Dopage.
Faisceaux électroniques.
TECHNOLOGY & ENGINEERING > Mechanical.
Electron beams
Ion bombardment
Ion implantation
Semiconductor doping
Ionenimplantation
Semiconductors > Implantation of ions
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Call Number: QC702.7.I55 I58 1984
 
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QC702.7.I55 I58 1984 Available