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Dry etching for microelectronics /

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This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides...

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Bibliographic Details
Corporate Author: ScienceDirect (Online service)
Other Authors: Powell, Ronald A.
Format: eBook
Language:English
Published: Amsterdam ; New York : New York, N.Y. : North-Holland Physics Pub. ; Distributors for the USA and Canada, Elsevier Science Pub. Co., 1984.
Series:Materials processing, theory and practices ; v. 4.
Subjects:
Semiconductors > Etching.
Plasma etching.
Semi-conducteurs > Attaque chimique.
Gravure par plasma.
Plasma etching
Semiconductors > Etching
Halbleitertechnologie
Ionenstrahlätzen
Mikroelektronik
Trockenätzen
Electronic equipment > Integrated circuits > Construction > Methods
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Call Number: TK7871.85 .D79 1984
 
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TK7871.85 .D79 1984 Available