Instabilities in silicon devices. Volume 3, New insulators, devices and radiation effects /
Silicon technology today forms the basis of a world-wide, multi-billion dollar component industry. The reason for this expansion can be found not only in the physical properties of silicon but also in the unique properties of the silicon-silicon dioxide interface. However, silicon devices are still...
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| Other Authors: | , |
| Format: | eBook |
| Language: | English |
| Language Notes: | English text with abstracts in French and German. |
| Published: |
1999.
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| Online Access: | Connect to the full text of this electronic book |
Internet
Connect to the full text of this electronic bookAvailable Online
| Call Number: |
TK7871.15.S55 I57 1999 |
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| Call Number | Status | Get It |
| TK7871.15.S55 I57 1999 | Available | |