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X-ray metrology in semiconductor manufacturing /

The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (...

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Bibliographic Details
Main Author: Bowen, D. Keith (David Keith), 1940- (Author)
Corporate Author: Taylor & Francis
Other Authors: Tanner, B. K. (Brian Keith)
Format: eBook
Language:English
Language Notes:English.
Published: Boca Raton : CRC/Taylor & Francis, 2006.
Subjects:
Semiconductors > Design and construction > Quality control.
Integrated circuits > Measurement.
Semiconductor wafers > Inspection.
X-rays > Diffraction.
Fluoroscopy.
Plaquettes à gravure en semi-conducteurs > Inspection.
Rayons X > Diffraction.
Radioscopie.
x-ray diffraction.
Fluoroscopy
Integrated circuits > Measurement
X-rays > Diffraction
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Call Number: TK7874.58 .B69 2006
 
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