High-k gate dielectric materials : applications with advanced metal oxide semiconductor field effect transistors (MOSFETs) /

"This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strateg...

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Bibliographic Details
Corporate Author: Taylor & Francis
Other Authors: Maity, Niladri Pratap (Editor), Maity, Reshmi (Editor), Baishya, Srimanta (Editor)
Format: eBook
Language:English
Published: Burlington, ON, Canada ; Palm Bay, Florida, USA : Apple Academic Press, 2020.
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Call Number: QC585
 
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