High-k gate dielectric materials : applications with advanced metal oxide semiconductor field effect transistors (MOSFETs) /
"This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strateg...
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Bibliographic Details
| Corporate Author: |
Taylor & Francis |
| Other Authors: |
Maity, Niladri Pratap
(Editor),
Maity, Reshmi
(Editor),
Baishya, Srimanta
(Editor) |
| Format: | eBook
|
| Language: | English |
| Published: |
Burlington, ON, Canada ; Palm Bay, Florida, USA :
Apple Academic Press,
2020.
|
| Subjects: | |
| Online Access: | Connect to the full text of this electronic book
|