Machine learning-based modelling in atomic layer deposition processes

While thin film technology has benefited greatly from artificial intelligence (AI) and machine learning (ML) techniques, there is still much to be learned from a full-scale exploration of these technologies in atomic layer deposition (ALD). This book provides in-depth information regarding the appli...

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Bibliographic Details

Main Author:	Adeleke, Oluwatobi (Author)
Corporate Author:	Taylor & Francis
Other Authors:	Karimzadeh, Sina, Jen, Tien-Chien
Format:	eBook
Language:	English
Published:	Boca Raton, FL : CRC Press, 2024.
Series:	Emerging materials and technologies.
Subjects:	Thin films. Machine learning. Thin films industry > Technological innovations. TECHNOLOGY / Manufacturing Electronic books.
Online Access:	Connect to the full text of this electronic book