Strain-engineered MOSFETs /

"This book brings together new developments in the area of spin-engineered MOSFETs using high-mobility substrates such as SIGe, strained-Si, germanium-on-insulator, and III-V semiconductors. The authors cover the materials aspects, principles, design, fabrication, and applications of advanced d...

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Bibliographic Details
Main Author: Maiti, C. K.
Corporate Author: Taylor & Francis
Other Authors: Maiti, T. K.
Format: eBook
Language:English
Published: Boca Raton, FL : CRC Press, ©2013.
Subjects:
Online Access:Connect to the full text of this electronic book
Connect to the full text of this electronic book
Connect to the full text of this electronic book
Description
Summary:"This book brings together new developments in the area of spin-engineered MOSFETs using high-mobility substrates such as SIGe, strained-Si, germanium-on-insulator, and III-V semiconductors. The authors cover the materials aspects, principles, design, fabrication, and applications of advanced devices. They present a full TCAD methodology for strain-engineering in Si CMOS technology involving data flow from process simulation to systematic process variability simulation and generation of SPICE process compact models for manufacturing for yield optimization"--
Physical Description:1 online resource (xix, 288 pages) : illustrations
Bibliography:Includes bibliographical references.
ISBN:1466500557
9781466500556
9781466503472
1466503475
1138075604
9781138075603