Strain-engineered MOSFETs /
"This book brings together new developments in the area of spin-engineered MOSFETs using high-mobility substrates such as SIGe, strained-Si, germanium-on-insulator, and III-V semiconductors. The authors cover the materials aspects, principles, design, fabrication, and applications of advanced d...
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| Format: | eBook |
| Language: | English |
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Boca Raton, FL :
CRC Press,
©2013.
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| Online Access: | Connect to the full text of this electronic book Connect to the full text of this electronic book Connect to the full text of this electronic book |
| Summary: | "This book brings together new developments in the area of spin-engineered MOSFETs using high-mobility substrates such as SIGe, strained-Si, germanium-on-insulator, and III-V semiconductors. The authors cover the materials aspects, principles, design, fabrication, and applications of advanced devices. They present a full TCAD methodology for strain-engineering in Si CMOS technology involving data flow from process simulation to systematic process variability simulation and generation of SPICE process compact models for manufacturing for yield optimization"-- |
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| Physical Description: | 1 online resource (xix, 288 pages) : illustrations |
| Bibliography: | Includes bibliographical references. |
| ISBN: | 1466500557 9781466500556 9781466503472 1466503475 1138075604 9781138075603 |