Strain-engineered MOSFETs /

"This book brings together new developments in the area of spin-engineered MOSFETs using high-mobility substrates such as SIGe, strained-Si, germanium-on-insulator, and III-V semiconductors. The authors cover the materials aspects, principles, design, fabrication, and applications of advanced d...

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Bibliographic Details
Main Author: Maiti, C. K.
Corporate Author: Taylor & Francis
Other Authors: Maiti, T. K.
Format: eBook
Language:English
Published: Boca Raton, FL : CRC Press, ©2013.
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Call Number: TK7871.99.M44 M248 2012
 
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TK7871.99.M44 M248 2012 Available