Strained-Si heterostructure field effect devices /

A combination of the materials science, manufacturing processes, and pioneering research and developments of SiGe and strained-Si have offered an unprecedented high level of performance enhancement at low manufacturing costs. Encompassing all of these areas, Strained-Si Heterostructure Field Effect...

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Bibliographic Details
Main Author: Maiti, C. K.
Corporate Author: Taylor & Francis
Other Authors: Chattopadhyay, Swapan, 1952-, Bera, L. K.
Format: eBook
Language:English
Language Notes:English.
Published: Boca Raton : CRC Press, Ã2007.
Series:Series in materials science and engineering.
Subjects:
Online Access:Connect to the full text of this electronic book
Description
Summary:A combination of the materials science, manufacturing processes, and pioneering research and developments of SiGe and strained-Si have offered an unprecedented high level of performance enhancement at low manufacturing costs. Encompassing all of these areas, Strained-Si Heterostructure Field Effect Devices addresses the research needs associated with the front-end aspects of extending CMOS technology via strain engineering. The book provides the basis to compare existing technologies with the future technological directions of silicon heterostructure CMOS. After an introduction to the material.
Physical Description:1 online resource (423 pages) : illustrations.
Bibliography:Includes bibliographical references and index.
ISBN:9780750309936
0750309938
0429145527
9780429145520
1420012347
9781420012347