Materials for microlithography : radiation-sensitive polymers : based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984 /
| Corporate Authors: | , , |
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| Other Authors: | , , |
| Format: | eBook |
| Language: | English |
| Published: |
Washington, D.C. :
American Chemical Society,
1984.
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| Series: | ACS symposium series ;
266. |
| Subjects: | |
| Online Access: | Connect to the full text of this electronic book |
Table of Contents:
- Fundamental limits of lithography / T.E. Everhart
- Practical and fundamental aspects of lithography / A.N. Broers
- A perspective on resist materials for fine-line lithography / M.J. Bowden
- Fundamental radiation chemistry : fundamental aspects of polymer degradation by high-energy radiation / D.J.T. Hill, J.H. O'Donnell, and P.J. Pomery
- Pulse radiolysis studies on the mechanism of the high sensitivity of chloromethylated polystyrene as an electron negative resist / Y. Tabata, S. Tagawa, and M. Washio
- Photochemistry of ketone polymers in the solid phase : a review / J.E. Guillet, S.-K.L. Li, and H.C. Ng
- Radiolysis of poly(isopropenyl t-butyl ketone) / S.A. Macdonald, H. Ito, C.G. Willson, J.W. Moore, H.M. Gharapetian, and J.E. Guillet
- Polymer-bonded electron-transfer sensitizers / S. Tazuke, R. Takasaki, Y. Iwaya, and Y. Suzuki
- Laser-induced polymerization / C. Decker
- Novel synthesis and photochemical reaction of the polymers with pendant photosensitive and photosensitizer groups / T. Nishikubo, T. Iizawa, and E. Takahashi
- A novel technique for determining radiation chemical yields of negative electron-beam resists / A. Novembre and T.N. Bowmer
- Anomalous topochemical photoreaction of olefin crystals / M. Hasegawa, K. Saigo, and T. Mori
- The photo-Fries rearrangement and its use in polymeric imaging systems / T.G. Tessier, J.M.J. Frechet, C.G. Willson, and H. Ito
- Soluble polysilane derivatives : interesting new radiation-sensitive polymers / R.D. Miller, D. Hofer, D.R. McKean, C.G. Willson, R. West, and P.T. Trefonas, III
- Preparation and resolution characteristics of a novel silicone-based negative resist / A. Tanaka, M. Morita, S. Imamura, T. Tamamura, and O. Kogure
- Positive-working electron-beam resists based on maleic anhydride copolymers / K.U. Pohl, F. Rodriguez, Y.M.N. Namaste, and S.K. Obendorf
- Functionally substituted Novolak resins : lithographic applications, radiation chemistry, and photooxidation / H. Hiraoka
- Synthesis, characterization and lithographic evaluation of chlorinated polymethylstyrene / R. Tarascon, M. Hartney, and M.J. Bowden
- Photochemistry of ketone polymers in the solid phase : thin film studies of vinyl ketone polymers / J.E. Guillet, S.-K.L. Li, S.A. Macdonald, and C.G. Willson
- Polymers of [alpha]-substituted benzyl methacrylates and aliphatic aldehydes as new types of electron-beam resists / K. Hatada, T. Kitayama, Y. Okamoto, H. Yuki, H. Aritome, S. Namba, K. Nate, T. Inoue, and H. Yokono
- Radiation chemistry of phenolic resin containing epoxy and azide compounds / H. Shiraishi, T. Ueno, O. Suga, and S. Nonogaki
- Organic direct optical recording media / L. Alexandru, M.A. Hopper, R.O. Loutfy, J.H. Sharp, P.S. Vincett, G.E. Johnson, and K.Y. Law
- Primary and secondary reactions in photoinitiated free-radical polymerization of organic coatings / A. Hult and B. Ranby
- Radiation stability of silicon elastomers / G.C. Corfield, D.T. Astill, and D.W. Clegg.