Materials for microlithography : radiation-sensitive polymers : based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984 /

Bibliographic Details
Corporate Authors:	American Chemical Society. Division of Polymeric Materials: Science and Engineering, American Chemical Society. Division of Polymer Chemistry, American Chemical Society. Meeting
Other Authors:	Thompson, L. F., 1944-, Willson, C. G. (C. Grant), 1939-, Fréchet, Jean M. J.
Format:	eBook
Language:	English
Published:	Washington, D.C. : American Chemical Society, 1984.
Series:	ACS symposium series ; 266.
Subjects:	Polymers > Congresses. Photoresists > Congresses. Microlithography > Materials > Congresses. Microelectronics > Materials > Congresses. Polymères > Congrès. Résines photosensibles > Congrès. Microlithographie > Matériaux > Congrès. Microélectronique > Matériaux > Congrès. TECHNOLOGY & ENGINEERING > Mechanical. Microelectronics > Materials Microlithography > Materials Photoresists Polymers Microlithographie > Congrès. Electronic books. Conference papers and proceedings
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