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Materials for microlithography : radiation-sensitive polymers : based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984 /

Bibliographic Details
Corporate Authors: American Chemical Society. Division of Polymeric Materials: Science and Engineering, American Chemical Society. Division of Polymer Chemistry, American Chemical Society. Meeting
Other Authors: Thompson, L. F., 1944-, Willson, C. G. (C. Grant), 1939-, Fréchet, Jean M. J.
Format: eBook
Language:English
Published: Washington, D.C. : American Chemical Society, 1984.
Series:ACS symposium series ; 266.
Subjects:
Polymers > Congresses.
Photoresists > Congresses.
Microlithography > Materials > Congresses.
Microelectronics > Materials > Congresses.
Polymères > Congrès.
Résines photosensibles > Congrès.
Microlithographie > Matériaux > Congrès.
Microélectronique > Matériaux > Congrès.
TECHNOLOGY & ENGINEERING > Mechanical.
Microelectronics > Materials
Microlithography > Materials
Photoresists
Polymers
Microlithographie > Congrès.
Electronic books.
Conference papers and proceedings
Online Access:Connect to the full text of this electronic book
Description
Item Description:Title from PDF title page (ACS publications, viewed September 17, 2009).
Physical Description:1 online resource (viii, 494 pages) : illustrations
Format:Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Bibliography:Includes bibliographical references and indexes.
ISBN:9780841210943
0841210942