APA (7th ed.) Citation

American Chemical Society. Division of Polymeric Materials: Science and Engineering, American Chemical Society. Division of Polymer Chemistry, American Chemical Society. Meeting, Thompson, L. F., Willson, C. G., & Fréchet, J. M. J. (1984). Materials for microlithography: Radiation-sensitive polymers : based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984. American Chemical Society.

Chicago Style (17th ed.) Citation

American Chemical Society. Division of Polymeric Materials: Science and Engineering, American Chemical Society. Division of Polymer Chemistry, American Chemical Society. Meeting, L. F. Thompson, C. G. Willson, and Jean M. J. Fréchet. Materials for Microlithography: Radiation-sensitive Polymers : Based on a Symposium Cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984. Washington, D.C.: American Chemical Society, 1984.

MLA (9th ed.) Citation

American Chemical Society. Division of Polymeric Materials: Science and Engineering, et al. Materials for Microlithography: Radiation-sensitive Polymers : Based on a Symposium Cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984. American Chemical Society, 1984.