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Integrated circuits : chemical and physical processing : developed from the winter symposium sponsored by the Division of Industrial and Engineering Chemistry of the American Chemical Society, University of California--Davis, March 26-27, 1984 /

Bibliographic Details
Corporate Authors: American Chemical Society. Division of Industrial and Engineering Chemistry, American Chemical Society. Division of Industrial and Engineering Chemistry. Winter Symposium
Other Authors: Stroeve, Pieter, 1945-
Format: eBook
Language:English
Language Notes:English.
Published: Washington, D.C. : American Chemical Society, 1985.
Series:ACS symposium series ; 290.
Subjects:
Integrated circuits > Very large scale integration > Design and construction > Congresses.
Semiconductors.
Electronics.
Computers
Semiconductors
Electronics
Electrical Equipment and Supplies
Silicon > chemistry
Thermal Diffusion
Chlorine > chemistry
Oxides > chemistry
Germanium > chemistry
Circuits intégrés à très grande échelle > Conception et construction > Congrès.
Ordinateurs.
Semi-conducteurs.
Électronique.
computers.
semiconductor.
TECHNOLOGY & ENGINEERING > Mechanical.
Integrated circuits > Very large scale integration > Design and construction
Electronic books.
Conference papers and proceedings
Online Access:Connect to the full text of this electronic book
Table of Contents:
  • Unit processes in the manufacture of integrated circuits / Pieter Stroeve
  • Conservation laws for mass, momentum, and energy : application to semiconductor devices and technology / Bill Baerg
  • Silicon oxidation : a process step for the manufacture of integrated circuits / Eugene A. Irene
  • Convective diffusion in zone refining of low Prandtl number liquid metals and semiconductors / William N. Gill, Nicholas D. Kazarinoff, and John D. Verhoeven
  • Research opportunities in resist technology / David S. Soong
  • Physical and chemical modifications of photoresists / Peter C. Sukanek
  • Effects of developer concentration on linewidth control in positive photoresists / Tom Batchelder
  • The advantage of molecular-beam epitaxy for device applications / A.Y. Cho
  • Chemical and physical processing of ion-implanted integrated circuits / Joseph C. Plunkett
  • Plasma-assisted processing : the etching of polysilicon in a diatomic chlorine discharge / Herbert H. Sawin, Albert D. Richards, and Brian E. Thompson
  • Applications of oxides and nitrides of germanium for semiconductor devices / O.J. Gregory and E.E. Crisman
  • Vapor-phase epitaxy of Group III-V compound optoelectronic devices / G.H. Olsen
  • Advanced device isolation for very large scale integration / H.B. Pogge
  • Solid-liquid equilibrium in ternary Group III-V semiconductor materials / T.L. Aselage, K.M. Chang, and T.J. Anderson : preparation of device-quality strained-layer superlattices / R.M. Biefeld
  • Wafer design and characterization for integrated-circuit processes / R. Schindler, D. Huber, and J. Reffle.