Cover Image

Effect of titanium (Ti)-seed and in vacuo process flow on sputtered lead zirconate titanate thin films /

Bibliographic Details
Main Author: Potrepka, Daniel M. (Author)
Format: Government Document eBook
Language:English
Published: Aberdeen Proving Ground, MD : DEVCOM, Army Research Laboratory, Sep 2019.
Series:Memorandum report ARL-MR ; 1007.
Subjects:
Ferroelectric thin films > Analysis.
Sputtering (Physics)
X-rays > Diffraction.
Electron microscopy.
Technical reports.
Online Access:https://purl.fdlp.gov/GPO/gpo215004
Description
Item Description:"Sep 2019."
"Approved for public release; distribution is unlimited."
"Performing organization: CCDC Army Research Laboratory"--Report documentation page.
In scope of the U.S. Government Publishing Office Cataloging and Indexing Program (C&I) and Federal Depository Library Program (FDLP).
GPO Cataloging Record Distribution Program (CRDP).
Physical Description:1 online resource (v, 30 pages) : illustrations (some color).
Bibliography:Includes bibliographical references (pages 15-16).