Silicon technologies : ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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| Format: | eBook |
| Language: | English |
| Published: |
London : Hoboken, NJ :
ISTE ; Wiley,
2011.
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| Online Access: | Connect to the full text of this electronic book |
| Summary: | The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. |
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| Item Description: | Title from PDF title page (viewed on Feb. 28, 2013). |
| Physical Description: | 1 online resource : illustrations |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 9781118601044 1118601041 9781118601112 1118601114 9781118601143 1118601149 |