Silicon technologies : ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Bibliographic Details

Other Authors:	Baudrant, Annie
Format:	eBook
Language:	English
Published:	London : Hoboken, NJ : ISTE ; Wiley, 2011.
Subjects:	Semiconductor doping. Ion implantation. Semiconductors > Heat treatment.
Online Access:	Connect to the full text of this electronic book