Optical physics for nanolithography /
This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essentia...
| Main Authors: | , |
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| Corporate Author: | |
| Format: | eBook |
| Language: | English |
| Published: |
Bellingham, Washington (1000 20th St. Bellingham WA 98225-6705 USA) :
SPIE,
2018.
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| Series: | SPIE Press monograph ;
PM284. |
| Subjects: | |
| Online Access: | Connect to the full text of this electronic book |
| Summary: | This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essential principles, and all derivations are presented with their intermediate steps. For increased accessibility, simplified and consistent notations are used throughout the text. Full-color pages illustrate the connections between figures and equations. |
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| Physical Description: | 1 online resource (352 pages) : color illustrations |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 1510617388 9781510617384 |