Optical physics for nanolithography /

This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essentia...

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Bibliographic Details

Main Authors:	Yen, Anthony (Author), Yu, Shinn-Sheng (Author)
Corporate Author:	Knovel (Firm)
Format:	eBook
Language:	English
Published:	Bellingham, Washington (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE, 2018.
Series:	SPIE Press monograph ; PM284.
Subjects:	Optics. Imaging systems. Nanolithography. Optique. Imagerie (Technique) Nanolithographie. optics. Electronic books.
Online Access:	Connect to the full text of this electronic book