Electromigration in metals : fundamentals to nano-interconnects /

Bibliographic Details
Main Authors:	Ho, P. S. (Author), Hu, Chao-Kun, 1946- (Author), Gall, Martin (Author), Sukharev, Valeriy, 1952- (Author)
Corporate Author:	Cambridge University Press
Format:	eBook
Language:	English
Published:	Cambridge, United Kingdom ; New York, NY : Cambridge University Press, 2022.
Subjects:	Interconnects (Integrated circuit technology) > Materials. Metals > Electric properties. Electrodiffusion. Interconnexions (Technologie des circuits inteÌ?greÌ?s) > MateÌ?riaux. MeÌ?taux > ProprieÌ?teÌ?s eÌ?lectriques. EÌ?lectromigration. Electronic books.
Online Access:	Connect to the full text of this electronic book

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