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Optical lithography : here is why /

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This book is aimed at new and experienced engineers, technology managers and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the b...

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Bibliographic Details
Main Author: Lin, Burn Jeng, 1942- (Author)
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2021].
Edition:Second edition.
Subjects:
Microlithography.
Semiconductors > Etching.
Lasers > Industrial applications.
Table of Contents:
  • Preface
  • 1 Introduction
  • 2 Proximity Printing
  • 3 Exposure Systems
  • 4 Image Formation
  • 5 The Metrics of Lithography: Exposure-Defocus (E-D) Tools
  • 6 Hardware Components in Optical Lithography
  • 7 Processing and Optimization
  • 8 Immersion Lithography
  • 9 EUV Lithography
  • Appendix A: Methods to Evaluate the Region of Validity Based on Lithography Applications
  • References
  • Index.