Long-Term Reliability of Nanometer VLSI Systems : Modeling, Analysis and Optimization /

This book provides readers with a detailed reference regarding two of the most important long-term reliability and aging effects on nanometer integrated systems, electromigrations (EM) for interconnect and biased temperature instability (BTI) for CMOS devices. The authors discuss in detail recent de...

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Bibliographic Details
Main Authors: Tan, Sheldon (Author), Tahoori, Mehdi (Author), Kim, Taeyoung (Author), Wang, Shengcheng (Author), Sun, Zeyu (Author), Kiamehr, Saman (Author)
Corporate Author: SpringerLink (Online service)
Format: eBook
Language:English
Published: Cham : Springer International Publishing : Imprint: Springer, 2019.
Edition:1st ed. 2019.
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Call Number: TK7867-7867.5
 
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