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Long-term reliability of nanometer VLSI systems : modeling, analysis and optimization /

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This book provides readers with a detailed reference regarding two of the most important long-term reliability and aging effects on nanometer integrated systems, electromigrations (EM) for interconnect and biased temperature instability (BTI) for CMOS devices. The authors discuss in detail recent de...

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Bibliographic Details
Main Authors: Tan, Sheldon X. D. (Author), Tahoori, Mehdi (Author), Kim, Taeyoung (Author), Wang, Shengcheng (Author), Sun, Zeyu (Author), Kiamehr, Saman (Author)
Format: Book
Language:English
Published: Cham : Springer, [2019]
Subjects:
Nanoelectromechanical systems.
Integrated circuits > Very large scale integration.
Online Access:SpringerLink
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