Long-term reliability of nanometer VLSI systems : modeling, analysis and optimization /

This book provides readers with a detailed reference regarding two of the most important long-term reliability and aging effects on nanometer integrated systems, electromigrations (EM) for interconnect and biased temperature instability (BTI) for CMOS devices. The authors discuss in detail recent de...

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Bibliographic Details

Main Authors:	Tan, Sheldon X. D. (Author), Tahoori, Mehdi (Author), Kim, Taeyoung (Author), Wang, Shengcheng (Author), Sun, Zeyu (Author), Kiamehr, Saman (Author)
Format:	Book
Language:	English
Published:	Cham : Springer, [2019]
Subjects:	Nanoelectromechanical systems. Integrated circuits > Very large scale integration.
Online Access:	SpringerLink