Chemical vapour deposition : precursors, processes and applications /
Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD)...
| Other Authors: | , |
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| Format: | eBook |
| Language: | English |
| Published: |
Cambridge, UK :
Royal Society of Chemistry,
[2009]
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| Online Access: | Connect to the full text of this electronic book |
| Summary: | Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from thes. |
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| Item Description: | Electronic resource. |
| Physical Description: | 1 online resource (xv, 582 pages) : illustrations, plans |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 0854044655 1621987035 1847558798 9780854044658 9781621987031 9781847558794 |
| DOI: | 10.1039/9781847558794 |