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Silicon Technologies : Ion Implantation and Thermal Treatment /

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The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Bibliographic Details
Main Author: Baudrant, Annie (Author)
Corporate Author: Safari, an O'Reilly Media Company
Format: eBook
Language:English
Published: Wiley, 2011.
Edition:1st edition.
Subjects:
Electronic books.
Online Access:Connect to this electronic resource
Description
Summary:The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Item Description:Electronic resource.
Physical Description:1 online resource (368 pages)
Format:Mode of access: World Wide Web.