Computational Lithography /

A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since th...

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Bibliographic Details

Main Authors:	Arce, Gonzalo (Author), Ma, Xu (Author)
Corporate Author:	Safari, an O'Reilly Media Company
Format:	eBook
Language:	English
Published:	Wiley, 2010.
Edition:	1st edition.
Subjects:	Electronic books.
Online Access:	Connect to this electronic resource