Development of a photoelectrochemical etch process to enable heterogeneous substrate integration of epitaxial III-nitride semiconductors /
| Main Author: | |
|---|---|
| Format: | Government Document eBook |
| Language: | English |
| Published: |
Adelphi, MD :
US Army Research Laboratory,
December 2017.
|
| Subjects: | |
| Online Access: | https://purl.fdlp.gov/GPO/gpo116815 |
Internet
https://purl.fdlp.gov/GPO/gpo116815Available Online
| Call Number: |
D 101.133:8228 |
|
|---|---|---|
| Call Number | Status | Get It |
| D 101.133:8228 | Available | |