Optical physics for nanolithography /
This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essentia...
| Main Authors: | , |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Washington :
SPIE Press,
[2018]
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| Series: | SPIE monograph ;
PM284. |
| Subjects: |
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