Optical physics for nanolithography /

This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essentia...

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Bibliographic Details

Main Authors:	Yen, Anthony (Author), Yu, Shinn-Sheng (Author)
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE Press, [2018]
Series:	SPIE monograph ; PM284.
Subjects:	Imaging systems. Nanolithography. Optics.