Optical physics for nanolithography /
This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essentia...
| Main Authors: | , |
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| Format: | Book |
| Language: | English |
| Published: |
Bellingham, Washington :
SPIE Press,
[2018]
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| Series: | SPIE monograph ;
PM284. |
| Subjects: |
| Summary: | This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essential principles, and all derivations are presented with their intermediate steps. For increased accessibility, simplified and consistent notations are used throughout the text. Full-color pages illustrate the connections between figures and equations. |
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| Item Description: | "SPIE Press books." |
| Physical Description: | 336 pages : color illustrations ; 28 cm. Online version available. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 151061737X 9781510617377 |