Plasma etching processes for CMOS devices realization /

Bibliographic Details

Corporate Author:	ScienceDirect (Online service)
Other Authors:	Posseme, Nicolas (Editor)
Format:	eBook
Language:	English
Published:	London, UK : Kidlington, Oxford, UK : ISTE Press ; Elsevier, 2017.
Subjects:	Plasma etching. Metal oxide semiconductors, Complementary. Electronic books.
Online Access:	Connect to the full text of this electronic book