APA (7th ed.) Citation

Knovel (Firm), Doi, T. K., Marinescu, I. D., & Kurokawa, S. (2012). Advances in CMP/polishing technologies for the manufacture of electronic devices. Elsevier.

Chicago Style (17th ed.) Citation

Knovel (Firm), Toshiro K. Doi, Ioan D. Marinescu, and Syuhei Kurokawa. Advances in CMP/polishing Technologies for the Manufacture of Electronic Devices. Oxford: Elsevier, 2012.

MLA (9th ed.) Citation

Knovel (Firm), et al. Advances in CMP/polishing Technologies for the Manufacture of Electronic Devices. Elsevier, 2012.

Warning: These citations may not always be 100% accurate.