Advances in CMP/polishing technologies for the manufacture of electronic devices /

Bibliographic Details
Corporate Author:	Knovel (Firm)
Other Authors:	Doi, Toshiro K., 1947-, Marinescu, Ioan D., Kurokawa, Syuhei
Format:	eBook
Language:	English
Published:	Oxford : Elsevier, 2012.
Edition:	1st ed.
Subjects:	Grinding and polishing. TECHNOLOGY & ENGINEERING > Technical & Manufacturing Industries & Trades. Electronic books.
Online Access:	Connect to the full text of this electronic book

Available Online