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Lithography process control /

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This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process...

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Bibliographic Details
Main Author: Levinson, Harry J.
Corporate Author: Knovel (Firm)
Format: eBook
Language:English
Published: Bellingham, Wash. : SPIE Optical Engineering Press, [1999]
Series:Tutorial texts in optical engineering ; v. TT 28.
Subjects:
Semiconductors > Etching.
Microlithography > Quality control.
Semiconducteurs > Attaque chimique.
Microlithographie > Qualité > Contrôle.
TECHNOLOGY & ENGINEERING > Mechanical.
Microlithographie.
Commande de processus.
Semiconducteurs > Qualité > Contrôle.
Lithographie (Halbleitertechnologie)
Statistische Prozesslenkung.
Electronic books.
Online Access:Connect to the full text of this electronic book
Description
Summary:This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.
Item Description:Electronic resource.
Physical Description:1 online resource (x, 190 pages) : illustrations.
Bibliography:Includes bibliographical references (pages 169-188) and index.
ISBN:9781615837366
1615837361
9780819478559
0819478555