Ionized-cluster beam deposition and epitaxy /
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited...
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| Format: | eBook |
| Language: | English |
| Published: |
Park Ridge, N.J., U.S.A. :
Noyes Publications,
[1988]
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| Series: | Materials science and process technology series.
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| Subjects: | |
| Online Access: | Connect to the full text of this electronic book |
| Summary: | The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin. |
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| Item Description: | Electronic resource. |
| Physical Description: | 1 online resource (viii, 231 pages) : illustrations. |
| Format: | Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 1591241073 9781591241072 9780815511687 081551168X |