Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /

An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.

Bibliographic Details

Corporate Author:	Knovel (Firm)
Other Authors:	Rossnagel, Stephen M., Cuomo, J. J., Westwood, William D. (William Dickson), 1937-
Format:	eBook
Language:	English
Published:	Park Ridge, N.J. : Noyes Publications, [1990]
Series:	Materials science and process technology series.
Subjects:	Plasma engineering. Semiconductors > Etching. Plasma etching. Electronic books.
Online Access:	Connect to the full text of this electronic book