Handbook of thin-film deposition processes and techniques : principles, methods, equipment and applications /

The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers...

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Bibliographic Details
Corporate Author: Knovel (Firm)
Other Authors: Seshan, Krishna
Format: eBook
Language:English
Published: Norwich, N.Y. : Noyes Publications/William Andrew Pub., [2002]
Edition:2nd ed.
Series:Materials science and process technology series. Electronic materials and process technology.
Subjects:
Online Access:Connect to the full text of this electronic book
Description
Summary:The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Item Description:Electronic resource.
Physical Description:1 online resource (xxviii, 629 pages) : illustrations.
Bibliography:Includes bibliographical references and index.
ISBN:1591241936
9781591241935
9780815517788
0815517785
9780815517764
0815517769