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Resolution enhancement techniques in optical lithography /

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Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolutio...

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Bibliographic Details
Main Author: Wong, Alfred Kwok-Kit
Corporate Author: Society of Photo-optical Instrumentation Engineers
Format: eBook
Language:English
Published: Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE, 2001.
Series:SPIE tutorial texts ; TT47.
Subjects:
Integrated circuits > Design and construction.
Microlithography.
Electronic books.
Online Access:Connect to the full text of this electronic book
Description
Summary:Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.
Item Description:"SPIE digital library."
Electronic resource.
Physical Description:1 online resource (xvii, 214 pages) : illustrations.
Also available in print version.
Format:Mode of access: World Wide Web.
System requirements: Adobe Acrobat Reader.
Bibliography:Includes bibliographical references (pages 189-208) and index.
ISBN:9780819478818 (electronic)
DOI:10.1117/3.401208
Access:Restricted to subscribers or individual electronic text purchasers.