Advanced processes for 193-nm immersion lithography /

This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as cours...

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Bibliographic Details

Main Author:	Wei, Yayi
Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Brainard, Robert L.
Format:	eBook
Language:	English
Published:	Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE, [2009]
Series:	SPIE monograph ; PM189.
Subjects:	Immersion lithography. Integrated circuits > Design and construction. Semiconductors > Etching. Electronic books.
Online Access:	Connect to the full text of this electronic book