Field guide to optical lithography /
The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photore...
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| Format: | eBook |
| Language: | English |
| Published: |
Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :
SPIE,
2006.
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| Series: | SPIE field guides ;
FG06. |
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| Online Access: | Connect to the full text of this electronic book |
| Summary: | The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry. |
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| Item Description: | "SPIE digital library." Electronic resource. |
| Physical Description: | 1 online resource (xii, 122 pages) : illustrations. Also available in print version. |
| Format: | Mode of access: World Wide Web. System requirements: Adobe Acrobat Reader. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 9780819478214 (electronic) |
| DOI: | 10.1117/3.665802 |
| Access: | Restricted to subscribers or individual electronic text purchasers. |