Molecular theory of lithography /

This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithograph...

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Bibliographic Details
Main Author: Okoroanyanwu, Uzodinma (Author)
Format: eBook
Language:English
Published: Bellingham, Washington (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE, 2015.
Series:SPIE Digital Library.
SPIE monograph ; PM255.
Subjects:
Online Access:Connect to the full text of this electronic book

MARC

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245 1 0 |a Molecular theory of lithography /  |c by Uzodinma Okoroanyanwu. 
264 1 |a Bellingham, Washington (1000 20th St. Bellingham WA 98225-6705 USA) :  |b SPIE,  |c 2015. 
300 |a 1 online resource (xix, 469 pages). 
336 |a text  |b txt  |2 rdacontent 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a SPIE Press monograph ;  |v PM255 
500 |a "SPIE Digital Library."--Website. 
504 |a Includes bibliographical references and index. 
505 0 |a Preface -- Acronyms and abbreviations -- 1. Overview of lithography -- 2. Theory of the lithographic process -- 3. Theory of molecular interactions in lithography -- 4. Theory of photochemical and radiochemical lithographic imaging mechanisms -- 5. Theory of block copolymer self-assembly lithographic imaging mechanisms -- 6. Theory of imprint lithographic imaging mechanisms -- Index. 
506 |a Restricted to subscribers or individual electronic text purchasers. 
520 |a This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The book is intended for student and professionals whose knowledge of lithography extends to the chemistry and physics underlying its various forms. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics will be helpful, as will be familiarity with elementary concepts in physics such as energy, force, electrostatics, electrodynamics, and optics. 
530 |a Also available in print version. 
538 |a Mode of access: World Wide Web. 
538 |a System requirements: Adobe Acrobat Reader. 
588 |a Title from PDF title page (SPIE eBooks Website, viewed 2015-11-13). 
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