Chemistry and lithography /

This book provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a general readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and o...

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Bibliographic Details
Main Author: Okoroanyanwu, Uzodinma
Corporate Author: Society of Photo-optical Instrumentation Engineers
Format: eBook
Language:English
Published: Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE, 2010.
Series:SPIE Digital Library.
SPIE monograph ; PM192.
Subjects:
Online Access:Connect to the full text of this electronic book
Description
Summary:This book provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a general readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology.
Item Description:"SPIE digital library."
Electronic resource.
Physical Description:1 online resource (xxv, 861 pages) : illustrations.
Also available in print version.
Format:Mode of access: World Wide Web.
System requirements: Adobe Acrobat Reader.
ISBN:9780819483997 (electronic)
DOI:10.1117/3.821384
Access:Restricted to subscribers or individual electronic text purchasers.