Chemistry and lithography /

This book provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a general readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and o...

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Bibliographic Details
Main Author: Okoroanyanwu, Uzodinma
Corporate Author: Society of Photo-optical Instrumentation Engineers
Format: eBook
Language:English
Published: Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE, 2010.
Series:SPIE Digital Library.
SPIE monograph ; PM192.
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Call Number: NE2425 .O38 2010eb
 
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NE2425 .O38 2010eb Available