EUV lithography /
Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an histor...
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| Format: | eBook |
| Language: | English |
| Published: |
Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :
SPIE,
[2009]
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| Series: | SPIE monograph ;
PM178. |
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| Online Access: | Connect to the full text of this electronic book |
| Summary: | Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. |
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| Item Description: | "SPIE digital library." Electronic resource. |
| Physical Description: | 1 online resource (xxvii, 673 pages) : illustrations. Also available in print version. |
| Format: | Mode of access: World Wide Web. System requirements: Adobe Acrobat Reader. |
| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 9780819480705 (electronic) |
| DOI: | 10.1117/3.769214 |
| Access: | Restricted to subscribers or individual electronic text purchasers. |