EUV sources for lithography /

This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and...

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Bibliographic Details

Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Bakshi, Vivek
Format:	eBook
Language:	English
Published:	Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : SPIE, [2006]
Series:	SPIE monograph ; PM149.
Subjects:	Extreme ultraviolet lithography. Lithography. Plasma (Ionized gases) Ultraviolet radiation > Industrial applications. Electronic books.
Online Access:	Connect to the full text of this electronic book