Fundamental Aspects of Silicon Oxidation /

This book presents fundamental experimental and theoretical developments relating to silicon oxidation for ultra-thin gate oxide formation. Starting with elementary processes taking place during wet chemical cleans prior to oxidation, the focus is then placed on the incorporation of oxygen into the...

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Bibliographic Details

Main Author:	Chabal, Yves J.
Corporate Author:	SpringerLink (Online service)
Format:	eBook
Language:	English
Published:	Berlin, Heidelberg : Springer Berlin Heidelberg, 2001.
Series:	Springer series in materials science ; 46.
Subjects:	Electronics. Optical materials. Surfaces (Physics) Electronic books.
Online Access:	Connect to the full text of this electronic book